Process Engineer

Substrate is addressing one of the most important technological problems facing the United States. At the intersection of advanced manufacturing and cutting-edge physics, we are developing technologies that will reshape the semiconductor industry and strengthen America's technological leadership. We are a team of world-class scientists, engineers, and technical experts building technology for the United States.

Summary

You will be responsible for prototyping critical components of our platform through process development and materials characterization. This role will require you to work hands-on in several cleanrooms and user facilities around the San Francisco Bay Area, conducting a mix of micro- and nanofabrication as well as characterization of the materials and structures that you create. This hands-on work will include (but will not be limited to) many nanofabrication techniques including lithography, wet and dry deposition and etching.

You will also participate in the build-up of Substrate’s own internal research facilities. You will be a key contributor to early-stage development and testing which are critical to our challenging mission to shape the semiconductor industry for decades to come.

Responsibilities

Collaborating closely with Substrate’s technical team to conceptualize, design, prototype, and characterize nanofabricated optical devices

Hands-on fabrication of MEMS/NEMS devices using techniques such as photo- and electron beam lithography, thin film deposition, and wet and dry etching. This work will be done in several user facilities (primarily around the San Francisco Bay Area, but with the possibility of travel beyond the Bay Area)

Iterating through structural designs and tuning lithography, deposition, and etch parameters to optimize processes and improve performance

Mechanical, optical, and chemical characterization of thin films using techniques such as profilometry, ellipsometry, and XPS

Characterization of pattern fidelity and resolution using techniques such as SEM and AFM

Conceptual contributions to fabrication strategies such as design of process flows, material compatibility studies, and mask layout CAD

Conceptual contributions to bulk material, nanopatterned structures, and thin film characterization strategies to better study the mechanical, chemical, and optical properties that drive device performance

Designing, coordinating, and conducting experiments in various user facilities

Contribution to the build-up and installation of Substrate’s own internal research facilities.

Recording, processing and interpreting data and results to the wider team

Required Qualifications

3+ years of hands-on micro- or nanofabrication experience in cleanroom user facilities

Demonstrated ability to work safely and collaboratively in a cleanroom user facility

Willingness and ability to work in several user facilities around the San Francisco Bay Area several days per week

Demonstrated experience handling delicate samples and operating complex fabrication and characterization equipment

Fundamental understanding of micro- and nanofabrication considerations such as top-down vs. bottom-up, pattern transfer, material compatibilities, etch selectivity and directionality, and thin film and surface engineering

Understanding of the mechanical, optical, and chemical properties of materials which typically determine the performance of nanofabricated devices

Strong written and oral communication skills. High attention to detail and organizational skills

Ability to solve complex design challenges both independently and as part of a team

Ability to collaborate with a large and multidisciplinary technical group

B.S. or higher degree in chemical engineering, electrical engineering, materials science, mechanical engineering, physics, or a related discipline in the physical or engineering sciences

Preferred Qualifications

3+ years of hands-on experience in characterization techniques such as electron microscopy and scanning probe microscopy

Experience operating a Raith EBPG 5200/5200+, including aligned exposures